DESIGN AND IMPLEMENTATION OF DIGITAL SIGNAL PROCESSING SYSTEM USING ESP32 FOR THIN FILM THICKNESS MEASUREMENT SYSTEM USING ROTATING ANALYZER ELLIPSOMETRY METHOD
The loss of production failure in the semiconductor industry caused by inaccuracy of the thickness of the photoresist layer above the wafer surface is the reason for making this thin film measurement system. This system uses the Rotating-Analyzer Ellipsometry (RAE) algorithm. Microcontroller ESP...
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| Format: | Final Project |
| Language: | Indonesia |
| Online Access: | https://digilib.itb.ac.id/gdl/view/38357 |
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| Institution: | Institut Teknologi Bandung |
| Language: | Indonesia |
| Summary: | The loss of production failure in the semiconductor industry caused by inaccuracy of
the thickness of the photoresist layer above the wafer surface is the reason for making
this thin film measurement system. This system uses the Rotating-Analyzer
Ellipsometry (RAE) algorithm.
Microcontroller ESP32 will read the intensity signal in the form of output voltage from
the detector to be processed digitally to get the thickness value of the sample. The
signal is a sinusoidal signal as a function of the analyzer angle. This system can take
measurements very quickly because it only requires intensity signal from 1 optical
cycle or ½ mechanical rotation of the analyzer (A = 0 ° to A = 180 °). The intensity
signal of one optical cycle will be used to calculate the ellipsometric parameters (?
and ?). By knowing the values of ? and ?, the value of sample thickness can also be
determined.
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