Investigation of surface roughness on platinum deposited wafer after reactive ion etching using SF₆+Argon gaseous

Investigation of surface roughness on platinum deposited wafer after reactive ion etching using SF₆+Argon gaseous

Link to publisher's homepage at http://www.ttp.net/

Saved in:
Bibliographic Details
Main Authors: Zaliman, Sauli, Dr., Retnasamy, Vithyacharan, Aaron, Koay Terr Yeow, Siew Chui, Goh, Khairul Anwar, Mohamad Khazali, Nooraihan, Abdullah
Other Authors: zaliman@unimap.edu.my
Format: Article
Language:English
Published: Trans Tech Publications 2014
Subjects:
DOE
Platinum
Reactive Ion Etching (RIE)
SF₆+Argon
Surface roughness
Online Access:http://dspace.unimap.edu.my:80/dspace/handle/123456789/33656
Tags: Add Tag
No Tags, Be the first to tag this record!
Institution: Universiti Malaysia Perlis
Language: English
Description
Summary:Link to publisher's homepage at http://www.ttp.net/

Similar Items