Interwell coupling effect in Si/SiGe quantum wells grown by ultra high vacuum chemical vapor deposition

• Main Authors: Wang, Rui, Yoon, Soon Fatt, Lu, Fen, Fan, Weijun, Liu, Chongyang, Loh, Ter-Hoe, Nguyen, Hoai Son, Narayanan, Balasubramanian
• Other Authors: School of Electrical and Electronic Engineering
• Format: Article
• Language: English
• Published: 2013
• Subjects: Electrical and Electronic Engineering
• Online Access: https://hdl.handle.net/10356/100764; http://hdl.handle.net/10220/18135
• Institution: Nanyang Technological University

Si/Si0.66Ge0.34 coupled quantum well (CQW) structures with different barrier thickness of 40, 4 and 2 nm were grown on Si substrates using an ultra high vacuum chemical vapor deposition (UHVCVD) system. The samples were characterized using high resolution x-ray diffraction (HRXRD), crosssectional transmission electron microscopy (XTEM) and photoluminescence (PL) spectroscopy. Blue shift in PL peak energy due to interwell coupling was observed in the CQWs following increase in the Si barrier thickness. The Si/SiGe heterostructure growth process and theoretical band structure model was validated by comparing the energy of the no-phonon peak calculated by the 6 + 2-band k p method with experimental PL data. Close agreement between theoretical calculations and experimental data was obtained.