Design, fabrication, and characterization of three-dimensional embedded capacitor in through-silicon via
In this thesis, a novel integrated capacitor, called “three-dimensional (3-D) embedded capacitor” is proposed, designed, fabricated, and characterized for application in integrated circuits (ICs) with through-silicon vias (TSVs). A significant capacitance density enhancement can be achieved for this...
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Format: | Theses and Dissertations |
Language: | English |
Published: |
2019
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Online Access: | https://hdl.handle.net/10356/102666 http://hdl.handle.net/10220/48586 |
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Institution: | Nanyang Technological University |
Language: | English |