Design, fabrication, and characterization of three-dimensional embedded capacitor in through-silicon via

In this thesis, a novel integrated capacitor, called “three-dimensional (3-D) embedded capacitor” is proposed, designed, fabricated, and characterized for application in integrated circuits (ICs) with through-silicon vias (TSVs). A significant capacitance density enhancement can be achieved for this...

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Bibliographic Details
Main Author: Lin, Ye
Other Authors: Tan Chuan Seng
Format: Theses and Dissertations
Language:English
Published: 2019
Subjects:
Online Access:https://hdl.handle.net/10356/102666
http://hdl.handle.net/10220/48586
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Institution: Nanyang Technological University
Language: English

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