Layer-by-layer thinning of MoS2 by thermal annealing

By thermal annealing, few-layer MoS2 flakes can be thinned down. In one hour, the upper layer is peeled off due to sublimation. Eventually, monolayer MoS2 is achieved. We have characterized the process by optical contrast, Raman spectroscopy and atomic force microscopy (AFM), and observed a mixture...

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Main Authors: Lu, Xin, Utama, Muhammad Iqbal Bakti, Zhang, Jun, Zhao, Yanyuan, Xiong, Qihua
Other Authors: School of Electrical and Electronic Engineering
Format: Article
Language:English
Published: 2014
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Online Access:https://hdl.handle.net/10356/103445
http://hdl.handle.net/10220/24522
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Institution: Nanyang Technological University
Language: English
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spelling sg-ntu-dr.10356-1034452023-02-28T19:43:57Z Layer-by-layer thinning of MoS2 by thermal annealing Lu, Xin Utama, Muhammad Iqbal Bakti Zhang, Jun Zhao, Yanyuan Xiong, Qihua School of Electrical and Electronic Engineering School of Physical and Mathematical Sciences DRNTU::Engineering::Materials::Microelectronics and semiconductor materials::Thin films By thermal annealing, few-layer MoS2 flakes can be thinned down. In one hour, the upper layer is peeled off due to sublimation. Eventually, monolayer MoS2 is achieved. We have characterized the process by optical contrast, Raman spectroscopy and atomic force microscopy (AFM), and observed a mixture of surfaces of N and N − 1 layers. Published version 2014-12-22T07:20:09Z 2019-12-06T21:12:50Z 2014-12-22T07:20:09Z 2019-12-06T21:12:50Z 2013 2013 Journal Article Lu, X., Utama, M. I. B., Zhang, J., Zhao, Y., & Xiong, Q. (2013). Layer-by-layer thinning of MoS 2 by thermal annealing. Nanoscale, 5(19), 8904-8908. https://hdl.handle.net/10356/103445 http://hdl.handle.net/10220/24522 10.1039/C3NR03101B en Nanoscale This article is licensed under a Creative Commons Attribution 3.0 Unported Licence. 5 p. application/pdf
institution Nanyang Technological University
building NTU Library
continent Asia
country Singapore
Singapore
content_provider NTU Library
collection DR-NTU
language English
topic DRNTU::Engineering::Materials::Microelectronics and semiconductor materials::Thin films
spellingShingle DRNTU::Engineering::Materials::Microelectronics and semiconductor materials::Thin films
Lu, Xin
Utama, Muhammad Iqbal Bakti
Zhang, Jun
Zhao, Yanyuan
Xiong, Qihua
Layer-by-layer thinning of MoS2 by thermal annealing
description By thermal annealing, few-layer MoS2 flakes can be thinned down. In one hour, the upper layer is peeled off due to sublimation. Eventually, monolayer MoS2 is achieved. We have characterized the process by optical contrast, Raman spectroscopy and atomic force microscopy (AFM), and observed a mixture of surfaces of N and N − 1 layers.
author2 School of Electrical and Electronic Engineering
author_facet School of Electrical and Electronic Engineering
Lu, Xin
Utama, Muhammad Iqbal Bakti
Zhang, Jun
Zhao, Yanyuan
Xiong, Qihua
format Article
author Lu, Xin
Utama, Muhammad Iqbal Bakti
Zhang, Jun
Zhao, Yanyuan
Xiong, Qihua
author_sort Lu, Xin
title Layer-by-layer thinning of MoS2 by thermal annealing
title_short Layer-by-layer thinning of MoS2 by thermal annealing
title_full Layer-by-layer thinning of MoS2 by thermal annealing
title_fullStr Layer-by-layer thinning of MoS2 by thermal annealing
title_full_unstemmed Layer-by-layer thinning of MoS2 by thermal annealing
title_sort layer-by-layer thinning of mos2 by thermal annealing
publishDate 2014
url https://hdl.handle.net/10356/103445
http://hdl.handle.net/10220/24522
_version_ 1759858400485703680