Layer-by-layer thinning of MoS2 by thermal annealing

By thermal annealing, few-layer MoS2 flakes can be thinned down. In one hour, the upper layer is peeled off due to sublimation. Eventually, monolayer MoS2 is achieved. We have characterized the process by optical contrast, Raman spectroscopy and atomic force microscopy (AFM), and observed a mixture...

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Main Authors:	Lu, Xin, Utama, Muhammad Iqbal Bakti, Zhang, Jun, Zhao, Yanyuan, Xiong, Qihua
Other Authors:	School of Electrical and Electronic Engineering
Format:	Article
Language:	English
Published:	2014
Subjects:	DRNTU::Engineering::Materials::Microelectronics and semiconductor materials::Thin films
Online Access:	https://hdl.handle.net/10356/103445 http://hdl.handle.net/10220/24522
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Institution:	Nanyang Technological University
Language:	English

id	sg-ntu-dr.10356-103445
record_format	dspace
spelling	sg-ntu-dr.10356-1034452023-02-28T19:43:57Z Layer-by-layer thinning of MoS2 by thermal annealing Lu, Xin Utama, Muhammad Iqbal Bakti Zhang, Jun Zhao, Yanyuan Xiong, Qihua School of Electrical and Electronic Engineering School of Physical and Mathematical Sciences DRNTU::Engineering::Materials::Microelectronics and semiconductor materials::Thin films By thermal annealing, few-layer MoS2 flakes can be thinned down. In one hour, the upper layer is peeled off due to sublimation. Eventually, monolayer MoS2 is achieved. We have characterized the process by optical contrast, Raman spectroscopy and atomic force microscopy (AFM), and observed a mixture of surfaces of N and N − 1 layers. Published version 2014-12-22T07:20:09Z 2019-12-06T21:12:50Z 2014-12-22T07:20:09Z 2019-12-06T21:12:50Z 2013 2013 Journal Article Lu, X., Utama, M. I. B., Zhang, J., Zhao, Y., & Xiong, Q. (2013). Layer-by-layer thinning of MoS 2 by thermal annealing. Nanoscale, 5(19), 8904-8908. https://hdl.handle.net/10356/103445 http://hdl.handle.net/10220/24522 10.1039/C3NR03101B en Nanoscale This article is licensed under a Creative Commons Attribution 3.0 Unported Licence. 5 p. application/pdf
institution	Nanyang Technological University
building	NTU Library
continent	Asia
country	Singapore Singapore
content_provider	NTU Library
collection	DR-NTU
language	English
topic	DRNTU::Engineering::Materials::Microelectronics and semiconductor materials::Thin films
spellingShingle	DRNTU::Engineering::Materials::Microelectronics and semiconductor materials::Thin films Lu, Xin Utama, Muhammad Iqbal Bakti Zhang, Jun Zhao, Yanyuan Xiong, Qihua Layer-by-layer thinning of MoS2 by thermal annealing
description	By thermal annealing, few-layer MoS2 flakes can be thinned down. In one hour, the upper layer is peeled off due to sublimation. Eventually, monolayer MoS2 is achieved. We have characterized the process by optical contrast, Raman spectroscopy and atomic force microscopy (AFM), and observed a mixture of surfaces of N and N − 1 layers.
author2	School of Electrical and Electronic Engineering
author_facet	School of Electrical and Electronic Engineering Lu, Xin Utama, Muhammad Iqbal Bakti Zhang, Jun Zhao, Yanyuan Xiong, Qihua
format	Article
author	Lu, Xin Utama, Muhammad Iqbal Bakti Zhang, Jun Zhao, Yanyuan Xiong, Qihua
author_sort	Lu, Xin
title	Layer-by-layer thinning of MoS2 by thermal annealing
title_short	Layer-by-layer thinning of MoS2 by thermal annealing
title_full	Layer-by-layer thinning of MoS2 by thermal annealing
title_fullStr	Layer-by-layer thinning of MoS2 by thermal annealing
title_full_unstemmed	Layer-by-layer thinning of MoS2 by thermal annealing
title_sort	layer-by-layer thinning of mos2 by thermal annealing
publishDate	2014
url	https://hdl.handle.net/10356/103445 http://hdl.handle.net/10220/24522
_version_	1759858400485703680

Layer-by-layer thinning of MoS2 by thermal annealing

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