Growth and characterization of AlGaN/GaN/AlGaN double-heterojunction high-electron-mobility transistors on 100-mm Si(111) using ammonia-molecular beam epitaxy

To improve the confinement of two-dimensional electron gas (2DEG) in AlGaN/GaN high electron mobility transistor (HEMT) heterostructures, AlGaN/GaN/AlGaN double heterojunction HEMT (DH-HEMT) heterostructures were grown using ammonia-MBE on 100-mm Si substrate. Prior to the growth, single heterojunct...

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Main Authors: Ravikiran, L., Dharmarasu, N., Radhakrishnan, K., Agrawal, M., Yiding, Lin, Arulkumaran, S., Vicknesh, S., Ng, G. I.
Other Authors: School of Electrical and Electronic Engineering
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Language:English
Published: 2015
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Online Access:https://hdl.handle.net/10356/107000
http://hdl.handle.net/10220/25221
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spelling sg-ntu-dr.10356-1070002020-09-26T22:17:12Z Growth and characterization of AlGaN/GaN/AlGaN double-heterojunction high-electron-mobility transistors on 100-mm Si(111) using ammonia-molecular beam epitaxy Ravikiran, L. Dharmarasu, N. Radhakrishnan, K. Agrawal, M. Yiding, Lin Arulkumaran, S. Vicknesh, S. Ng, G. I. School of Electrical and Electronic Engineering Temasek Laboratories DRNTU::Science::Physics To improve the confinement of two-dimensional electron gas (2DEG) in AlGaN/GaN high electron mobility transistor (HEMT) heterostructures, AlGaN/GaN/AlGaN double heterojunction HEMT (DH-HEMT) heterostructures were grown using ammonia-MBE on 100-mm Si substrate. Prior to the growth, single heterojunction HEMT (SH-HEMT) and DH-HEMT heterostructures were simulated using Poisson-Schrödinger equations. From simulations, an AlGaN buffer with “Al” mole fraction of 10% in the DH-HEMT was identified to result in both higher 2DEG concentration (∼1013 cm−2) and improved 2DEG confinement in the channel. Hence, this composition was considered for the growth of the buffer in the DH-HEMT heterostructure. Hall measurements showed a room temperature 2DEG mobility of 1510 cm2/V.s and a sheet carrier concentration (ns) of 0.97 × 1013 cm−2 for the DH-HEMT structure, while they are 1310 cm2/V.s and 1.09 × 1013 cm−2, respectively, for the SH-HEMT. Capacitance-voltage measurements confirmed the improvement in the confinement of 2DEG in the DH-HEMT heterostructure, which helped in the enhancement of its room temperature mobility. DH-HEMT showed 3 times higher buffer break-down voltage compared to SH-HEMT, while both devices showed almost similar drain current density. Small signal RF measurements on the DH-HEMT showed a unity current-gain cut-off frequency (f T) and maximum oscillation frequency (f max) of 22 and 25 GHz, respectively. Thus, overall, DH-HEMT heterostructure was found to be advantageous due to its higher buffer break-down voltages compared to SH-HEMT heterostructure. Published version 2015-03-10T06:27:54Z 2019-12-06T22:22:49Z 2015-03-10T06:27:54Z 2019-12-06T22:22:49Z 2015 2015 Journal Article Ravikiran, L., Dharmarasu, N., Radhakrishnan, K., Agrawal, M., Yiding, L., Arulkumaran, S., et al. (2015). Growth and characterization of AlGaN/GaN/AlGaN double-heterojunction high-electron-mobility transistors on 100-mm Si(111) using ammonia-molecular beam epitaxy. Journal of applied physics, 117(2), 025301-. 0021-8979 https://hdl.handle.net/10356/107000 http://hdl.handle.net/10220/25221 10.1063/1.4905620 en Journal of applied physics © 2015 AIP Publishing LLC. This paper was published in Journal of Applied Physics and is made available as an electronic reprint (preprint) with permission of AIP Publishing LLC. The paper can be found at the following official DOI: [http://dx.doi.org/10.1063/1.4905620].  One print or electronic copy may be made for personal use only. Systematic or multiple reproduction, distribution to multiple locations via electronic or other means, duplication of any material in this paper for a fee or for commercial purposes, or modification of the content of the paper is prohibited and is subject to penalties under law. 8 p. application/pdf
institution Nanyang Technological University
building NTU Library
country Singapore
collection DR-NTU
language English
topic DRNTU::Science::Physics
spellingShingle DRNTU::Science::Physics
Ravikiran, L.
Dharmarasu, N.
Radhakrishnan, K.
Agrawal, M.
Yiding, Lin
Arulkumaran, S.
Vicknesh, S.
Ng, G. I.
Growth and characterization of AlGaN/GaN/AlGaN double-heterojunction high-electron-mobility transistors on 100-mm Si(111) using ammonia-molecular beam epitaxy
description To improve the confinement of two-dimensional electron gas (2DEG) in AlGaN/GaN high electron mobility transistor (HEMT) heterostructures, AlGaN/GaN/AlGaN double heterojunction HEMT (DH-HEMT) heterostructures were grown using ammonia-MBE on 100-mm Si substrate. Prior to the growth, single heterojunction HEMT (SH-HEMT) and DH-HEMT heterostructures were simulated using Poisson-Schrödinger equations. From simulations, an AlGaN buffer with “Al” mole fraction of 10% in the DH-HEMT was identified to result in both higher 2DEG concentration (∼1013 cm−2) and improved 2DEG confinement in the channel. Hence, this composition was considered for the growth of the buffer in the DH-HEMT heterostructure. Hall measurements showed a room temperature 2DEG mobility of 1510 cm2/V.s and a sheet carrier concentration (ns) of 0.97 × 1013 cm−2 for the DH-HEMT structure, while they are 1310 cm2/V.s and 1.09 × 1013 cm−2, respectively, for the SH-HEMT. Capacitance-voltage measurements confirmed the improvement in the confinement of 2DEG in the DH-HEMT heterostructure, which helped in the enhancement of its room temperature mobility. DH-HEMT showed 3 times higher buffer break-down voltage compared to SH-HEMT, while both devices showed almost similar drain current density. Small signal RF measurements on the DH-HEMT showed a unity current-gain cut-off frequency (f T) and maximum oscillation frequency (f max) of 22 and 25 GHz, respectively. Thus, overall, DH-HEMT heterostructure was found to be advantageous due to its higher buffer break-down voltages compared to SH-HEMT heterostructure.
author2 School of Electrical and Electronic Engineering
author_facet School of Electrical and Electronic Engineering
Ravikiran, L.
Dharmarasu, N.
Radhakrishnan, K.
Agrawal, M.
Yiding, Lin
Arulkumaran, S.
Vicknesh, S.
Ng, G. I.
format Article
author Ravikiran, L.
Dharmarasu, N.
Radhakrishnan, K.
Agrawal, M.
Yiding, Lin
Arulkumaran, S.
Vicknesh, S.
Ng, G. I.
author_sort Ravikiran, L.
title Growth and characterization of AlGaN/GaN/AlGaN double-heterojunction high-electron-mobility transistors on 100-mm Si(111) using ammonia-molecular beam epitaxy
title_short Growth and characterization of AlGaN/GaN/AlGaN double-heterojunction high-electron-mobility transistors on 100-mm Si(111) using ammonia-molecular beam epitaxy
title_full Growth and characterization of AlGaN/GaN/AlGaN double-heterojunction high-electron-mobility transistors on 100-mm Si(111) using ammonia-molecular beam epitaxy
title_fullStr Growth and characterization of AlGaN/GaN/AlGaN double-heterojunction high-electron-mobility transistors on 100-mm Si(111) using ammonia-molecular beam epitaxy
title_full_unstemmed Growth and characterization of AlGaN/GaN/AlGaN double-heterojunction high-electron-mobility transistors on 100-mm Si(111) using ammonia-molecular beam epitaxy
title_sort growth and characterization of algan/gan/algan double-heterojunction high-electron-mobility transistors on 100-mm si(111) using ammonia-molecular beam epitaxy
publishDate 2015
url https://hdl.handle.net/10356/107000
http://hdl.handle.net/10220/25221
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