Characterization of hydrogenated amorphous silicon (a-Si:H) film stacks for deep submicron fuse link applications

• Main Author: Ang, Ting Cheong
• Other Authors: Tse, Man Siu
• Format: Theses and Dissertations
• Language: English
• Published: 2008
• Subjects: DRNTU::Engineering::Electrical and electronic engineering::Microelectronics; DRNTU::Engineering::Materials::Material testing and characterization
• Online Access: http://hdl.handle.net/10356/13363
• Institution: Nanyang Technological University

In the first part of the project, the characteristics of Plasma Enhanced Chemical Vapour Deposition (PECVD) ct-Si:H films deposited using pure Silane plasma and Silane plasma diluted with Argon under different deposition conditions were investigated in terms of the deposition rate, hydrogen content,...