Characterization of hydrogenated amorphous silicon (a-Si:H) film stacks for deep submicron fuse link applications
In the first part of the project, the characteristics of Plasma Enhanced Chemical Vapour Deposition (PECVD) ct-Si:H films deposited using pure Silane plasma and Silane plasma diluted with Argon under different deposition conditions were investigated in terms of the deposition rate, hydrogen content,...
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| Format: | Theses and Dissertations |
| Language: | English |
| Published: |
2008
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| Online Access: | http://hdl.handle.net/10356/13363 |
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| Institution: | Nanyang Technological University |
| Language: | English |