Cyclic scheduling analysis of single-arm cluster tools with wafer residency time constraint and chamber cleaning operations
In semiconductor manufacturing, a cleaning operation that takes significant time is required for eliminating the chemical residual in a chamber after a wafer being processed and removed from it. Such a cleaning operation makes a traditional backward strategy inefficient. In the existing work, it is...
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Main Authors: | Yang, FaJun, Wu, NaiQi, Su, Rong, Qiao, Yan |
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Other Authors: | School of Electrical and Electronic Engineering |
Format: | Conference or Workshop Item |
Language: | English |
Published: |
2020
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Subjects: | |
Online Access: | https://hdl.handle.net/10356/140220 |
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Institution: | Nanyang Technological University |
Language: | English |
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