An application of incremental scheduling to a cluster photolithography tool

Optimization is an important area of research. As many optimization problems are NP-Hard it is important to have a wide selection of heuristic approaches to choose from when solving problems. Prioritized planning is a technique traditionally used to solve the multi-robot path planning problem. In th...

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Main Authors: Ware, Simon, Su, Rong
Other Authors: School of Electrical and Electronic Engineering
Format: Conference or Workshop Item
Language:English
Published: 2020
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Online Access:https://hdl.handle.net/10356/141780
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Institution: Nanyang Technological University
Language: English
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spelling sg-ntu-dr.10356-1417802020-06-10T09:26:43Z An application of incremental scheduling to a cluster photolithography tool Ware, Simon Su, Rong School of Electrical and Electronic Engineering - Delta-NTU Corporate Labfor Cyber-Physical Systems Engineering::Electrical and electronic engineering Schedulin Cluster Optimization is an important area of research. As many optimization problems are NP-Hard it is important to have a wide selection of heuristic approaches to choose from when solving problems. Prioritized planning is a technique traditionally used to solve the multi-robot path planning problem. In this paper we investigate how incremental scheduling, a technique based upon prioritized planning can be applied to scheduling wafer processing in a cluster tool. For our test case our approach is shown to be capable of finding a plan of equal quality to other scheduling approaches and thus suggests our method could be of potential use in other manufacturing/material handling applications. NRF (Natl Research Foundation, S’pore) Published version 2020-06-10T09:22:53Z 2020-06-10T09:22:53Z 2017 Conference Paper Ware, S., & Su, R. (2017). An application of incremental scheduling to a cluster photolithography tool. IFAC-PapersOnLine, 50(1), 1114-1120. doi:10.1016/j.ifacol.2017.08.393 2405-8963 https://hdl.handle.net/10356/141780 50 1114 1120 en © 2017 IFAC (International Federation of Automatic Control) Hosting by Elsevier Ltd. This is an open-access article distributed under the terms of the Creative Commons Attribution License. application/pdf
institution Nanyang Technological University
building NTU Library
country Singapore
collection DR-NTU
language English
topic Engineering::Electrical and electronic engineering
Schedulin
Cluster
spellingShingle Engineering::Electrical and electronic engineering
Schedulin
Cluster
Ware, Simon
Su, Rong
An application of incremental scheduling to a cluster photolithography tool
description Optimization is an important area of research. As many optimization problems are NP-Hard it is important to have a wide selection of heuristic approaches to choose from when solving problems. Prioritized planning is a technique traditionally used to solve the multi-robot path planning problem. In this paper we investigate how incremental scheduling, a technique based upon prioritized planning can be applied to scheduling wafer processing in a cluster tool. For our test case our approach is shown to be capable of finding a plan of equal quality to other scheduling approaches and thus suggests our method could be of potential use in other manufacturing/material handling applications.
author2 School of Electrical and Electronic Engineering
author_facet School of Electrical and Electronic Engineering
Ware, Simon
Su, Rong
format Conference or Workshop Item
author Ware, Simon
Su, Rong
author_sort Ware, Simon
title An application of incremental scheduling to a cluster photolithography tool
title_short An application of incremental scheduling to a cluster photolithography tool
title_full An application of incremental scheduling to a cluster photolithography tool
title_fullStr An application of incremental scheduling to a cluster photolithography tool
title_full_unstemmed An application of incremental scheduling to a cluster photolithography tool
title_sort application of incremental scheduling to a cluster photolithography tool
publishDate 2020
url https://hdl.handle.net/10356/141780
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