A study on Ga – Si interdiffusion during (Al)GaN/AlN growth on Si by plasma assisted molecular beam epitaxy
The Ga–Si interdiffusion during (Al)GaN/AlN growth on Si substrate by plasma assisted molecular beam epitaxy (PA-MBE) is studied. The epilayers were grown using a combination of different III/V ratios for GaN and AlN layers. The columnar morphology of the nitrogen-rich (III/V < 1) AlN nucleation...
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| Main Authors: | , , , , |
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| 其他作者: | |
| 格式: | Article |
| 語言: | English |
| 出版: |
2020
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| 主題: | |
| 在線閱讀: | https://hdl.handle.net/10356/143634 |
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| 總結: | The Ga–Si interdiffusion during (Al)GaN/AlN growth on Si substrate by plasma assisted molecular beam epitaxy (PA-MBE) is studied. The epilayers were grown using a combination of different III/V ratios for GaN and AlN layers. The columnar morphology of the nitrogen-rich (III/V < 1) AlN nucleation layer allows the migration of Ga metal into Si, leading to the interdiffusion. The presence of less Ga at the GaN/AlN interface and the two-step growth process of AlN with different column sizes on the top and bottom AlN completely eliminates the possibility of Ga–Si interdiffusion. Alternatively, a thin silicon nitride as a nucleation layer for the growth of (Al) GaN layers was also found to prevent the Ga–Si interdiffusion thereby circumventing the process of melt-back etching. |
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