Ultra-thin bulk silicon thinning of advanced microprocessors & graphics processors fabricated in Sub-20 nm technology

• Main Author: Teo, Wee Siang
• Other Authors: Gan Chee Lip
• Format: Thesis-Master by Research
• Language: English
• Published: Nanyang Technological University 2020
• Subjects: Engineering::Materials::Microelectronics and semiconductor materials
• Online Access: https://hdl.handle.net/10356/144132
• Institution: Nanyang Technological University

The continual advancement of integrated circuits has seen the relentless scaling of minimum dimensions for semiconductor devices. Consequently, the burgeoning complexity of process technology and devices fabricated has necessitated advancements in device characterisation all through the failure anal...