Highly conductive aligned carbon film for interconnect application
We demonstrate here an amorphous carbon film with a highly conductive transition phase for interconnect application. The uniform orientation of graphite-like sheet provides an effective carriers transport channel, thus significantly improves the conductivity of the amorphous carbon film. The electri...
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sg-ntu-dr.10356-1511812021-06-07T06:23:53Z Highly conductive aligned carbon film for interconnect application Li, Fushan Shakerzadeh, Maziar Tan, Chong Wei Yu, Hongyu Tay, Beng Kang School of Electrical and Electronic Engineering 2010 3rd International Nanoelectronics Conference (INEC) Engineering::Electrical and electronic engineering Carbon Film Microstructure We demonstrate here an amorphous carbon film with a highly conductive transition phase for interconnect application. The uniform orientation of graphite-like sheet provides an effective carriers transport channel, thus significantly improves the conductivity of the amorphous carbon film. The electrical properties of the aligned carbon film are investigated using Kelvin structure. Our results show that the resistivity of aligned carbon film is comparable with that of Cu, and the aligned carbon film holds promise for future interconnect application. Accepted version 2021-06-07T06:23:53Z 2021-06-07T06:23:53Z 2010 Conference Paper Li, F., Shakerzadeh, M., Tan, C. W., Yu, H. & Tay, B. K. (2010). Highly conductive aligned carbon film for interconnect application. 2010 3rd International Nanoelectronics Conference (INEC), 730-731. https://dx.doi.org/10.1109/INEC.2010.5424560 9781424435449 https://hdl.handle.net/10356/151181 10.1109/INEC.2010.5424560 2-s2.0-77951654025 730 731 en © 2010 IEEE. Personal use of this material is permitted. Permission from IEEE must be obtained for all other uses, in any current or future media, including reprinting/republishing this material for advertising or promotional purposes, creating new collective works, for resale or redistribution to servers or lists, or reuse of any copyrighted component of this work in other works. The published version is available at: https://doi.org/10.1109/INEC.2010.5424560. application/pdf |
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Engineering::Electrical and electronic engineering Carbon Film Microstructure Li, Fushan Shakerzadeh, Maziar Tan, Chong Wei Yu, Hongyu Tay, Beng Kang Highly conductive aligned carbon film for interconnect application |
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We demonstrate here an amorphous carbon film with a highly conductive transition phase for interconnect application. The uniform orientation of graphite-like sheet provides an effective carriers transport channel, thus significantly improves the conductivity of the amorphous carbon film. The electrical properties of the aligned carbon film are investigated using Kelvin structure. Our results show that the resistivity of aligned carbon film is comparable with that of Cu, and the aligned carbon film holds promise for future interconnect application. |
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School of Electrical and Electronic Engineering |
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School of Electrical and Electronic Engineering Li, Fushan Shakerzadeh, Maziar Tan, Chong Wei Yu, Hongyu Tay, Beng Kang |
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Conference or Workshop Item |
author |
Li, Fushan Shakerzadeh, Maziar Tan, Chong Wei Yu, Hongyu Tay, Beng Kang |
author_sort |
Li, Fushan |
title |
Highly conductive aligned carbon film for interconnect application |
title_short |
Highly conductive aligned carbon film for interconnect application |
title_full |
Highly conductive aligned carbon film for interconnect application |
title_fullStr |
Highly conductive aligned carbon film for interconnect application |
title_full_unstemmed |
Highly conductive aligned carbon film for interconnect application |
title_sort |
highly conductive aligned carbon film for interconnect application |
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2021 |
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https://hdl.handle.net/10356/151181 |
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1702431305432563712 |