Multi-foci laser separation of sapphire wafers with partial thickness scanning

With multi-foci laser cutting technology for sapphire wafer separation, the entire cross-section is generally scanned with single or multiple passes. This investigation proposes a new separation technique through partial thickness scanning. The energy effectivity and efficiency of the picosecond las...

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Main Authors: Lye, Celescia Siew Mun, Wang, Zhongke, Lam, Yee Cheong
Other Authors: School of Mechanical and Aerospace Engineering
Format: Article
Language:English
Published: 2022
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Online Access:https://hdl.handle.net/10356/160544
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Institution: Nanyang Technological University
Language: English
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spelling sg-ntu-dr.10356-1605442022-07-30T20:12:26Z Multi-foci laser separation of sapphire wafers with partial thickness scanning Lye, Celescia Siew Mun Wang, Zhongke Lam, Yee Cheong School of Mechanical and Aerospace Engineering Singapore Institute of Manufacturing Technology (SIMTech), A*STAR Genuine Solutions Pte Ltd. SIMTech-NTU Joint Laboratory (Precision Machining) Engineering::Mechanical engineering Multi-Foci Two-zone Partial Thickness Scanning With multi-foci laser cutting technology for sapphire wafer separation, the entire cross-section is generally scanned with single or multiple passes. This investigation proposes a new separation technique through partial thickness scanning. The energy effectivity and efficiency of the picosecond laser were enhanced through a two-zone partial thickness scanning by exploiting the internal reflection at the rough exit surface. Each zone spanned only one-third thickness of the cross-section, and only two out of three zones were scanned consecutively. A laser beam of 0.57 W and 50 kHz pulse repetition rate was split into 9 foci, each with a 2.20 μm calculated focused spot diameter. By only scanning the top two-thirds sample thickness, first its middle section then upper section, a cleavable sample could result. This was achieved with the lowest energy deposition at the fastest scanning speed of 10 mm/s investigated. Although with partial thickness scanning only, counter intuitively, the cleaved sample had a previously unattained uniform roughened sidewall profile over the entire thickness. This is a desirable outcome in LED manufacturing. As such, this proposed scheme could attain a cleavable sample with the desired uniformly roughened sidewall profile with less energy usage and faster scanning speed. Agency for Science, Technology and Research (A*STAR) Nanyang Technological University Published version The research work was supported by A*Star Research Entities, Singapore Institute of Manufacturing Technology (SIMTech) under SIMTech-NTU Joint Laboratory with project no. U12-M-007JL. 2022-07-26T07:42:19Z 2022-07-26T07:42:19Z 2022 Journal Article Lye, C. S. M., Wang, Z. & Lam, Y. C. (2022). Multi-foci laser separation of sapphire wafers with partial thickness scanning. Micromachines, 13(4), 506-. https://dx.doi.org/10.3390/mi13040506 2072-666X https://hdl.handle.net/10356/160544 10.3390/mi13040506 35457810 2-s2.0-85127618152 4 13 506 en U12-M-007JL Micromachines © 2022 by the authors. Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (https://creativecommons.org/licenses/by/4.0/). application/pdf
institution Nanyang Technological University
building NTU Library
continent Asia
country Singapore
Singapore
content_provider NTU Library
collection DR-NTU
language English
topic Engineering::Mechanical engineering
Multi-Foci
Two-zone Partial Thickness Scanning
spellingShingle Engineering::Mechanical engineering
Multi-Foci
Two-zone Partial Thickness Scanning
Lye, Celescia Siew Mun
Wang, Zhongke
Lam, Yee Cheong
Multi-foci laser separation of sapphire wafers with partial thickness scanning
description With multi-foci laser cutting technology for sapphire wafer separation, the entire cross-section is generally scanned with single or multiple passes. This investigation proposes a new separation technique through partial thickness scanning. The energy effectivity and efficiency of the picosecond laser were enhanced through a two-zone partial thickness scanning by exploiting the internal reflection at the rough exit surface. Each zone spanned only one-third thickness of the cross-section, and only two out of three zones were scanned consecutively. A laser beam of 0.57 W and 50 kHz pulse repetition rate was split into 9 foci, each with a 2.20 μm calculated focused spot diameter. By only scanning the top two-thirds sample thickness, first its middle section then upper section, a cleavable sample could result. This was achieved with the lowest energy deposition at the fastest scanning speed of 10 mm/s investigated. Although with partial thickness scanning only, counter intuitively, the cleaved sample had a previously unattained uniform roughened sidewall profile over the entire thickness. This is a desirable outcome in LED manufacturing. As such, this proposed scheme could attain a cleavable sample with the desired uniformly roughened sidewall profile with less energy usage and faster scanning speed.
author2 School of Mechanical and Aerospace Engineering
author_facet School of Mechanical and Aerospace Engineering
Lye, Celescia Siew Mun
Wang, Zhongke
Lam, Yee Cheong
format Article
author Lye, Celescia Siew Mun
Wang, Zhongke
Lam, Yee Cheong
author_sort Lye, Celescia Siew Mun
title Multi-foci laser separation of sapphire wafers with partial thickness scanning
title_short Multi-foci laser separation of sapphire wafers with partial thickness scanning
title_full Multi-foci laser separation of sapphire wafers with partial thickness scanning
title_fullStr Multi-foci laser separation of sapphire wafers with partial thickness scanning
title_full_unstemmed Multi-foci laser separation of sapphire wafers with partial thickness scanning
title_sort multi-foci laser separation of sapphire wafers with partial thickness scanning
publishDate 2022
url https://hdl.handle.net/10356/160544
_version_ 1739837447786725376