RF SOI EDMOS – reliability measurement
This project focuses on investigating the impact of Hot-Carrier Stress (HCS) on the performance of the EDNMOS transistors. The aim is to gain a better understanding of the Hot-Carrier Degradation (HCD) effects on the EDNMOS, which is important for improving the reliability and lifespan of such devic...
Saved in:
Main Author: | |
---|---|
Other Authors: | |
Format: | Final Year Project |
Language: | English |
Published: |
Nanyang Technological University
2023
|
Subjects: | |
Online Access: | https://hdl.handle.net/10356/167519 |
Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
Institution: | Nanyang Technological University |
Language: | English |
Summary: | This project focuses on investigating the impact of Hot-Carrier Stress (HCS) on the performance of the EDNMOS transistors. The aim is to gain a better understanding of the Hot-Carrier Degradation (HCD) effects on the EDNMOS, which is important for improving the reliability and lifespan of such devices. To achieve this, the EDNMOS transistors will be subjected to a variety of stress conditions, which include different temperatures, channel lengths, and biasing stress voltages. The collected data will then be analyzed, and the relationship between HCD and the shift in parameters of the EDNMOS will be thoroughly examined and debated. The ultimate goal of this project is to add to the existing knowledge base on EDNMOS reliability and to provide valuable data and insights that can be used to optimize and design such devices in future applications. |
---|