High-efficiency silicon nanowire array near infrared photodetectors via length control and SiOx surface passivation

Silicon (Si) nanowire (NW) array is a promising light-trapping platform due to the strong interaction between light and nanostructure. A photodetector benefits from the improved optical absorption in the Si NW array. Although the optical absorption increases with the NW length, the large NW length i...

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Main Authors: Son, Bongkwon, Shin, Sang-Ho, Zhao, Zhi-Jun, Ju, Byeong-Kwon, Jeong, Jun-Ho, Kim, Munho, Tan, Chuan Seng
Other Authors: School of Electrical and Electronic Engineering
Format: Article
Language:English
Published: 2023
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Online Access:https://hdl.handle.net/10356/168615
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spelling sg-ntu-dr.10356-1686152023-06-16T15:39:57Z High-efficiency silicon nanowire array near infrared photodetectors via length control and SiOx surface passivation Son, Bongkwon Shin, Sang-Ho Zhao, Zhi-Jun Ju, Byeong-Kwon Jeong, Jun-Ho Kim, Munho Tan, Chuan Seng School of Electrical and Electronic Engineering Engineering::Electrical and electronic engineering Nanostructure Photodetectors Silicon (Si) nanowire (NW) array is a promising light-trapping platform due to the strong interaction between light and nanostructure. A photodetector benefits from the improved optical absorption in the Si NW array. Although the optical absorption increases with the NW length, the large NW length is not always preferable owing to the large surface area. Here, the systematic study on the Si NW array photodetectors with varied NW lengths is investigated. It is revealed that the photodetectors with 1 μm length provide a highest responsivity of 0.65 A W−1 and a specific detectivity of 1.40 × 109 cm Hz1/2 W−1 at the wavelength of 1000 nm, including the dark current of 54 μA at 1 V. In addition, the silicon oxide (SiOx) surface passivation is introduced to induce the high photogain. As a result, the responsivity is improved by 13 times (0.55 A W−1) at 1100 nm. This work proposes high-efficiency Si NW array photodetectors by the NW array length control and the SiOx surface passivation. Agency for Science, Technology and Research (A*STAR) Ministry of Education (MOE) National Research Foundation (NRF) Submitted/Accepted version This work was supported by the National Research Foundation, Singapore, under its Competitive Research Program (CRP Award NRF-CRP19-2017- 01), A*STAR Programmatic Funds (Program No. A18A7b0058), AME IRG grant (Grant No. A20E5c0095), Ministry of Education AcRF Tier 1 (Grant No. 2021-T1-002-031 (RG112/21)), and Ministry of Education AcRF Tier 2 (Grant Nos. T2EP50120-0001 and T2EP50121-0002). S.-H.S. acknowledges Basic Science Research Program through the National Research Foundation of Korea (NRF) funded by the Ministry of Education (NRF- 2022R1I1A1A01053909) and the Brain Korea 21 Project in 2023. 2023-06-12T04:58:50Z 2023-06-12T04:58:50Z 2023 Journal Article Son, B., Shin, S., Zhao, Z., Ju, B., Jeong, J., Kim, M. & Tan, C. S. (2023). High-efficiency silicon nanowire array near infrared photodetectors via length control and SiOx surface passivation. Advanced Materials Technologies. https://dx.doi.org/10.1002/admt.202300131 2365-709X https://hdl.handle.net/10356/168615 10.1002/admt.202300131 en NRF-CRP19- 2017-01 T2EP50120-0001 T2EP50121-0002 A18A7b0058 A20E5c0095 MOE-2021-T1-002-031 (RG112/21) Advanced Materials Technologies © 2023 Wiley-VCH GmbH. All rights reserved. This is the peer reviewed version of the following article: Son, B., Shin, S., Zhao, Z., Ju, B., Jeong, J., Kim, M. & Tan, C. S. (2023). High-efficiency silicon nanowire array near infrared photodetectors via length control and SiOx surface passivation. Advanced Materials Technologies, which has been published in final form at https://doi.org/10.1002/admt.202300131. This article may be used for non-commercial purposes in accordance with Wiley Terms and Conditions for Use of Self-Archived Versions. application/pdf
institution Nanyang Technological University
building NTU Library
continent Asia
country Singapore
Singapore
content_provider NTU Library
collection DR-NTU
language English
topic Engineering::Electrical and electronic engineering
Nanostructure
Photodetectors
spellingShingle Engineering::Electrical and electronic engineering
Nanostructure
Photodetectors
Son, Bongkwon
Shin, Sang-Ho
Zhao, Zhi-Jun
Ju, Byeong-Kwon
Jeong, Jun-Ho
Kim, Munho
Tan, Chuan Seng
High-efficiency silicon nanowire array near infrared photodetectors via length control and SiOx surface passivation
description Silicon (Si) nanowire (NW) array is a promising light-trapping platform due to the strong interaction between light and nanostructure. A photodetector benefits from the improved optical absorption in the Si NW array. Although the optical absorption increases with the NW length, the large NW length is not always preferable owing to the large surface area. Here, the systematic study on the Si NW array photodetectors with varied NW lengths is investigated. It is revealed that the photodetectors with 1 μm length provide a highest responsivity of 0.65 A W−1 and a specific detectivity of 1.40 × 109 cm Hz1/2 W−1 at the wavelength of 1000 nm, including the dark current of 54 μA at 1 V. In addition, the silicon oxide (SiOx) surface passivation is introduced to induce the high photogain. As a result, the responsivity is improved by 13 times (0.55 A W−1) at 1100 nm. This work proposes high-efficiency Si NW array photodetectors by the NW array length control and the SiOx surface passivation.
author2 School of Electrical and Electronic Engineering
author_facet School of Electrical and Electronic Engineering
Son, Bongkwon
Shin, Sang-Ho
Zhao, Zhi-Jun
Ju, Byeong-Kwon
Jeong, Jun-Ho
Kim, Munho
Tan, Chuan Seng
format Article
author Son, Bongkwon
Shin, Sang-Ho
Zhao, Zhi-Jun
Ju, Byeong-Kwon
Jeong, Jun-Ho
Kim, Munho
Tan, Chuan Seng
author_sort Son, Bongkwon
title High-efficiency silicon nanowire array near infrared photodetectors via length control and SiOx surface passivation
title_short High-efficiency silicon nanowire array near infrared photodetectors via length control and SiOx surface passivation
title_full High-efficiency silicon nanowire array near infrared photodetectors via length control and SiOx surface passivation
title_fullStr High-efficiency silicon nanowire array near infrared photodetectors via length control and SiOx surface passivation
title_full_unstemmed High-efficiency silicon nanowire array near infrared photodetectors via length control and SiOx surface passivation
title_sort high-efficiency silicon nanowire array near infrared photodetectors via length control and siox surface passivation
publishDate 2023
url https://hdl.handle.net/10356/168615
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