Development of electron beam lithography process for the design and fabrication of sub-micron GaAs-based RF devices

This report presents the device fabrication and characterisation of the InxGa1-xP/In0.20Ga0.80As HEMT.

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Bibliographic Details
Main Author:	Yoon, Soon Fatt.
Other Authors:	School of Electrical and Electronic Engineering
Format:	Research Report
Published:	2008
Subjects:	DRNTU::Engineering::Electrical and electronic engineering::Electronic packaging
Online Access:	http://hdl.handle.net/10356/3038
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Institution:	Nanyang Technological University

id	sg-ntu-dr.10356-3038
record_format	dspace
spelling	sg-ntu-dr.10356-30382023-03-04T03:22:22Z Development of electron beam lithography process for the design and fabrication of sub-micron GaAs-based RF devices Yoon, Soon Fatt. School of Electrical and Electronic Engineering DRNTU::Engineering::Electrical and electronic engineering::Electronic packaging This report presents the device fabrication and characterisation of the InxGa1-xP/In0.20Ga0.80As HEMT. ARC 2/95 2008-09-17T09:19:19Z 2008-09-17T09:19:19Z 2000 2000 Research Report http://hdl.handle.net/10356/3038 Nanyang Technological University application/pdf
institution	Nanyang Technological University
building	NTU Library
continent	Asia
country	Singapore Singapore
content_provider	NTU Library
collection	DR-NTU
topic	DRNTU::Engineering::Electrical and electronic engineering::Electronic packaging
spellingShingle	DRNTU::Engineering::Electrical and electronic engineering::Electronic packaging Yoon, Soon Fatt. Development of electron beam lithography process for the design and fabrication of sub-micron GaAs-based RF devices
description	This report presents the device fabrication and characterisation of the InxGa1-xP/In0.20Ga0.80As HEMT.
author2	School of Electrical and Electronic Engineering
author_facet	School of Electrical and Electronic Engineering Yoon, Soon Fatt.
format	Research Report
author	Yoon, Soon Fatt.
author_sort	Yoon, Soon Fatt.
title	Development of electron beam lithography process for the design and fabrication of sub-micron GaAs-based RF devices
title_short	Development of electron beam lithography process for the design and fabrication of sub-micron GaAs-based RF devices
title_full	Development of electron beam lithography process for the design and fabrication of sub-micron GaAs-based RF devices
title_fullStr	Development of electron beam lithography process for the design and fabrication of sub-micron GaAs-based RF devices
title_full_unstemmed	Development of electron beam lithography process for the design and fabrication of sub-micron GaAs-based RF devices
title_sort	development of electron beam lithography process for the design and fabrication of sub-micron gaas-based rf devices
publishDate	2008
url	http://hdl.handle.net/10356/3038
_version_	1759855682625994752

Development of electron beam lithography process for the design and fabrication of sub-micron GaAs-based RF devices

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