Development of electron beam lithography process for the design and fabrication of sub-micron GaAs-based RF devices

This report presents the device fabrication and characterisation of the InxGa1-xP/In0.20Ga0.80As HEMT.

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Bibliographic Details
Main Author: Yoon, Soon Fatt.
Other Authors: School of Electrical and Electronic Engineering
Format: Research Report
Published: 2008
Subjects:
Online Access:http://hdl.handle.net/10356/3038
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Institution: Nanyang Technological University
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