Characterization of deep trench etch recipe

• Main Author: Tay, Chin Tiong.
• Other Authors: Prasad, Krishnamachar
• Format: Theses and Dissertations
• Published: 2008
• Subjects: DRNTU::Engineering::Electrical and electronic engineering::Microelectronics
• Online Access: http://hdl.handle.net/10356/3424
• Institution: Nanyang Technological University

This thesis presents the Design of Experiments (DOEs) done on deep trench etch recipe using Applied Material's decoupled plasma source reactor, DPS 5200 Centura II Deep Trench Etcher, intended for use in High Voltage Bipolar Transistor (HX) process development as isolation in X-Fab Semiconducto...