Characterization of deep trench etch recipe

This thesis presents the Design of Experiments (DOEs) done on deep trench etch recipe using Applied Material's decoupled plasma source reactor, DPS 5200 Centura II Deep Trench Etcher, intended for use in High Voltage Bipolar Transistor (HX) process development as isolation in X-Fab Semiconducto...

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Bibliographic Details
Main Author:	Tay, Chin Tiong.
Other Authors:	Prasad, Krishnamachar
Format:	Theses and Dissertations
Published:	2008
Subjects:	DRNTU::Engineering::Electrical and electronic engineering::Microelectronics
Online Access:	http://hdl.handle.net/10356/3424
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Institution:	Nanyang Technological University

id	sg-ntu-dr.10356-3424
record_format	dspace
spelling	sg-ntu-dr.10356-34242023-07-04T15:51:44Z Characterization of deep trench etch recipe Tay, Chin Tiong. Prasad, Krishnamachar School of Electrical and Electronic Engineering DRNTU::Engineering::Electrical and electronic engineering::Microelectronics This thesis presents the Design of Experiments (DOEs) done on deep trench etch recipe using Applied Material's decoupled plasma source reactor, DPS 5200 Centura II Deep Trench Etcher, intended for use in High Voltage Bipolar Transistor (HX) process development as isolation in X-Fab Semiconductor Foundry. The DOE results will be used for: · Fine-tuning of parameters to achieve desired trench profile · Troubleshooting on any drift in the input parameters · Future development of similar processes that required deep trench · Further improvement of the deep trench recipes Master of Science (Microelectronics) 2008-09-17T09:29:52Z 2008-09-17T09:29:52Z 2003 2003 Thesis http://hdl.handle.net/10356/3424 Nanyang Technological University application/pdf
institution	Nanyang Technological University
building	NTU Library
continent	Asia
country	Singapore Singapore
content_provider	NTU Library
collection	DR-NTU
topic	DRNTU::Engineering::Electrical and electronic engineering::Microelectronics
spellingShingle	DRNTU::Engineering::Electrical and electronic engineering::Microelectronics Tay, Chin Tiong. Characterization of deep trench etch recipe
description	This thesis presents the Design of Experiments (DOEs) done on deep trench etch recipe using Applied Material's decoupled plasma source reactor, DPS 5200 Centura II Deep Trench Etcher, intended for use in High Voltage Bipolar Transistor (HX) process development as isolation in X-Fab Semiconductor Foundry. The DOE results will be used for: · Fine-tuning of parameters to achieve desired trench profile · Troubleshooting on any drift in the input parameters · Future development of similar processes that required deep trench · Further improvement of the deep trench recipes
author2	Prasad, Krishnamachar
author_facet	Prasad, Krishnamachar Tay, Chin Tiong.
format	Theses and Dissertations
author	Tay, Chin Tiong.
author_sort	Tay, Chin Tiong.
title	Characterization of deep trench etch recipe
title_short	Characterization of deep trench etch recipe
title_full	Characterization of deep trench etch recipe
title_fullStr	Characterization of deep trench etch recipe
title_full_unstemmed	Characterization of deep trench etch recipe
title_sort	characterization of deep trench etch recipe
publishDate	2008
url	http://hdl.handle.net/10356/3424
_version_	1772825963618369536

Characterization of deep trench etch recipe

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