Fabrication of efficient micro- axicon by direct electron beam lithography for long non- diffracting distance of bessel beams

In this thesis, a novel technique has been employed in the realization of micro-axicon by single-step processing via electron beam lithography (EBL). The proposed technique is a simple, reliable and reproducible method for the production of high quality Bessel beams with long propagation invariant d...

Full description

Saved in:
Bibliographic Details
Main Author: Zhang, Lesheng
Other Authors: Yuan, Xiaocong
Format: Theses and Dissertations
Published: 2008
Subjects:
Online Access:http://hdl.handle.net/10356/3982
Tags: Add Tag
No Tags, Be the first to tag this record!
Institution: Nanyang Technological University
Description
Summary:In this thesis, a novel technique has been employed in the realization of micro-axicon by single-step processing via electron beam lithography (EBL). The proposed technique is a simple, reliable and reproducible method for the production of high quality Bessel beams with long propagation invariant distances, in our configuration, in excess of 20 cm.