Fabrication of efficient micro- axicon by direct electron beam lithography for long non- diffracting distance of bessel beams

In this thesis, a novel technique has been employed in the realization of micro-axicon by single-step processing via electron beam lithography (EBL). The proposed technique is a simple, reliable and reproducible method for the production of high quality Bessel beams with long propagation invariant d...

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Main Author: Zhang, Lesheng
Other Authors: Yuan, Xiaocong
Format: Theses and Dissertations
Published: 2008
Subjects:
Online Access:http://hdl.handle.net/10356/3982
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Institution: Nanyang Technological University
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spelling sg-ntu-dr.10356-39822023-07-04T15:16:43Z Fabrication of efficient micro- axicon by direct electron beam lithography for long non- diffracting distance of bessel beams Zhang, Lesheng Yuan, Xiaocong School of Electrical and Electronic Engineering DRNTU::Engineering::Electrical and electronic engineering::Electronic packaging In this thesis, a novel technique has been employed in the realization of micro-axicon by single-step processing via electron beam lithography (EBL). The proposed technique is a simple, reliable and reproducible method for the production of high quality Bessel beams with long propagation invariant distances, in our configuration, in excess of 20 cm. Master of Science (Photonics) 2008-09-17T09:41:46Z 2008-09-17T09:41:46Z 2005 2005 Thesis http://hdl.handle.net/10356/3982 Nanyang Technological University application/pdf
institution Nanyang Technological University
building NTU Library
continent Asia
country Singapore
Singapore
content_provider NTU Library
collection DR-NTU
topic DRNTU::Engineering::Electrical and electronic engineering::Electronic packaging
spellingShingle DRNTU::Engineering::Electrical and electronic engineering::Electronic packaging
Zhang, Lesheng
Fabrication of efficient micro- axicon by direct electron beam lithography for long non- diffracting distance of bessel beams
description In this thesis, a novel technique has been employed in the realization of micro-axicon by single-step processing via electron beam lithography (EBL). The proposed technique is a simple, reliable and reproducible method for the production of high quality Bessel beams with long propagation invariant distances, in our configuration, in excess of 20 cm.
author2 Yuan, Xiaocong
author_facet Yuan, Xiaocong
Zhang, Lesheng
format Theses and Dissertations
author Zhang, Lesheng
author_sort Zhang, Lesheng
title Fabrication of efficient micro- axicon by direct electron beam lithography for long non- diffracting distance of bessel beams
title_short Fabrication of efficient micro- axicon by direct electron beam lithography for long non- diffracting distance of bessel beams
title_full Fabrication of efficient micro- axicon by direct electron beam lithography for long non- diffracting distance of bessel beams
title_fullStr Fabrication of efficient micro- axicon by direct electron beam lithography for long non- diffracting distance of bessel beams
title_full_unstemmed Fabrication of efficient micro- axicon by direct electron beam lithography for long non- diffracting distance of bessel beams
title_sort fabrication of efficient micro- axicon by direct electron beam lithography for long non- diffracting distance of bessel beams
publishDate 2008
url http://hdl.handle.net/10356/3982
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