Dry plasma etching of III-V semiconductors for monolithic microwave integrated circuits fabrication

Dry plasma etching of III-V semiconductors for monolithic microwave integrated circuits fabrication

This thesis will address the development of via hole fabrication technologies for both GaAs and InP based devices for application in monolithic microwave integrated circuits (MMICs).

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Bibliographic Details
Main Author:	Chen, Yuwen.
Other Authors:	Radhakrishnan, K.
Format:	Theses and Dissertations
Published:	2008
Subjects:	DRNTU::Engineering::Electrical and electronic engineering::Microelectronics DRNTU::Engineering::Electrical and electronic engineering::Electronic apparatus and materials
Online Access:	http://hdl.handle.net/10356/4026
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Institution:	Nanyang Technological University

Description
Summary:	This thesis will address the development of via hole fabrication technologies for both GaAs and InP based devices for application in monolithic microwave integrated circuits (MMICs).