Dry plasma etching of III-V semiconductors for monolithic microwave integrated circuits fabrication

This thesis will address the development of via hole fabrication technologies for both GaAs and InP based devices for application in monolithic microwave integrated circuits (MMICs).

Saved in:

Bibliographic Details
Main Author:	Chen, Yuwen.
Other Authors:	Radhakrishnan, K.
Format:	Theses and Dissertations
Published:	2008
Subjects:	DRNTU::Engineering::Electrical and electronic engineering::Microelectronics DRNTU::Engineering::Electrical and electronic engineering::Electronic apparatus and materials
Online Access:	http://hdl.handle.net/10356/4026
Tags:	Add Tag No Tags, Be the first to tag this record!
Institution:	Nanyang Technological University

id	sg-ntu-dr.10356-4026
record_format	dspace
spelling	sg-ntu-dr.10356-40262023-07-04T15:16:06Z Dry plasma etching of III-V semiconductors for monolithic microwave integrated circuits fabrication Chen, Yuwen. Radhakrishnan, K. School of Electrical and Electronic Engineering Ooi, Boon Siew DRNTU::Engineering::Electrical and electronic engineering::Microelectronics DRNTU::Engineering::Electrical and electronic engineering::Electronic apparatus and materials This thesis will address the development of via hole fabrication technologies for both GaAs and InP based devices for application in monolithic microwave integrated circuits (MMICs). Doctor of Philosophy (EEE) 2008-09-17T09:42:50Z 2008-09-17T09:42:50Z 2002 2002 Thesis http://hdl.handle.net/10356/4026 Nanyang Technological University application/pdf
institution	Nanyang Technological University
building	NTU Library
continent	Asia
country	Singapore Singapore
content_provider	NTU Library
collection	DR-NTU
topic	DRNTU::Engineering::Electrical and electronic engineering::Microelectronics DRNTU::Engineering::Electrical and electronic engineering::Electronic apparatus and materials
spellingShingle	DRNTU::Engineering::Electrical and electronic engineering::Microelectronics DRNTU::Engineering::Electrical and electronic engineering::Electronic apparatus and materials Chen, Yuwen. Dry plasma etching of III-V semiconductors for monolithic microwave integrated circuits fabrication
description	This thesis will address the development of via hole fabrication technologies for both GaAs and InP based devices for application in monolithic microwave integrated circuits (MMICs).
author2	Radhakrishnan, K.
author_facet	Radhakrishnan, K. Chen, Yuwen.
format	Theses and Dissertations
author	Chen, Yuwen.
author_sort	Chen, Yuwen.
title	Dry plasma etching of III-V semiconductors for monolithic microwave integrated circuits fabrication
title_short	Dry plasma etching of III-V semiconductors for monolithic microwave integrated circuits fabrication
title_full	Dry plasma etching of III-V semiconductors for monolithic microwave integrated circuits fabrication
title_fullStr	Dry plasma etching of III-V semiconductors for monolithic microwave integrated circuits fabrication
title_full_unstemmed	Dry plasma etching of III-V semiconductors for monolithic microwave integrated circuits fabrication
title_sort	dry plasma etching of iii-v semiconductors for monolithic microwave integrated circuits fabrication
publishDate	2008
url	http://hdl.handle.net/10356/4026
_version_	1772825191861190656

Dry plasma etching of III-V semiconductors for monolithic microwave integrated circuits fabrication

Similar Items