Dry plasma etching of III-V semiconductors for monolithic microwave integrated circuits fabrication

• Main Author: Chen, Yuwen.
• Other Authors: Radhakrishnan, K.
• Format: Theses and Dissertations
• Published: 2008
• Subjects: DRNTU::Engineering::Electrical and electronic engineering::Microelectronics; DRNTU::Engineering::Electrical and electronic engineering::Electronic apparatus and materials
• Online Access: http://hdl.handle.net/10356/4026
• Institution: Nanyang Technological University

This thesis will address the development of via hole fabrication technologies for both GaAs and InP based devices for application in monolithic microwave integrated circuits (MMICs).