Novel transistor structures for future deep submicron MOS applications

• Main Author: Theng, Ah Leong
• Other Authors: Goh Wang Ling
• Format: Theses and Dissertations
• Language: English
• Published: 2010
• Subjects: DRNTU::Engineering::Electrical and electronic engineering::Electronic circuits
• Online Access: https://hdl.handle.net/10356/41403
• Institution: Nanyang Technological University

Bulk silicon CMOS processing is reaching the limits in device scaling and fabrication. Silicon-an-Insulator (Sal) technology provides an alternative. It not only allows better scalability but also a solution to low power and high performance applications for next generation CMOS devices. Fully deple...