Carbon films deposition by filtered cathodic vacuum arc technique

• المؤلف الرئيسي: Tay, Beng Kang
• مؤلفون آخرون: School of Electrical and Electronic Engineering
• التنسيق: Research Report
• اللغة: English
• منشور في: 2012
• الموضوعات: DRNTU::Engineering::Electrical and electronic engineering::Microelectronics
• الوصول للمادة أونلاين: http://hdl.handle.net/10356/48031

Thin carbon films have been deposited by filtered cathode vacuum arc technique and a low bias voltage power supply. The substrate bias voltage ranged from -80 to -400V. It is important for thin films to have low internal stress and good adhesive properties for any applications. The results ascertain...