Carbon films deposition by filtered cathodic vacuum arc technique

Thin carbon films have been deposited by filtered cathode vacuum arc technique and a low bias voltage power supply. The substrate bias voltage ranged from -80 to -400V. It is important for thin films to have low internal stress and good adhesive properties for any applications. The results ascertain...

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Bibliographic Details
Main Author: Tay, Beng Kang
Other Authors: School of Electrical and Electronic Engineering
Format: Research Report
Language:English
Published: 2012
Subjects:
Online Access:http://hdl.handle.net/10356/48031
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Institution: Nanyang Technological University
Language: English

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