Carbon films deposition by filtered cathodic vacuum arc technique
Thin carbon films have been deposited by filtered cathode vacuum arc technique and a low bias voltage power supply. The substrate bias voltage ranged from -80 to -400V. It is important for thin films to have low internal stress and good adhesive properties for any applications. The results ascertain...
Saved in:
Main Author: | |
---|---|
Other Authors: | |
Format: | Research Report |
Language: | English |
Published: |
2012
|
Subjects: | |
Online Access: | http://hdl.handle.net/10356/48031 |
Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
Institution: | Nanyang Technological University |
Language: | English |
Be the first to leave a comment!