Characterisation of ZnO thin films produced by filtered cathodic vacuum arc technique

• المؤلف الرئيسي: Tse, Kit Yan.
• مؤلفون آخرون: Hng, Huey Hoon
• التنسيق: Theses and Dissertations
• اللغة: English
• منشور في: 2008
• الموضوعات: DRNTU::Engineering::Materials::Photonics and optoelectronics materials
• الوصول للمادة أونلاين: http://hdl.handle.net/10356/5124

ZnO thin films were deposited on (100)Si substrates using filtered cathodic vacuum arc (FCVA) technique at various temperature (room temperature to 420 degree) and with different nitrogen to oxygen flow rate ratios (01. to 0.5) at 200 degree celsius.