Characterisation of ZnO thin films produced by filtered cathodic vacuum arc technique

• Main Author: Tse, Kit Yan.
• Other Authors: Hng, Huey Hoon
• Format: Theses and Dissertations
• Language: English
• Published: 2008
• Subjects: DRNTU::Engineering::Materials::Photonics and optoelectronics materials
• Online Access: http://hdl.handle.net/10356/5124
• Institution: Nanyang Technological University

ZnO thin films were deposited on (100)Si substrates using filtered cathodic vacuum arc (FCVA) technique at various temperature (room temperature to 420 degree) and with different nitrogen to oxygen flow rate ratios (01. to 0.5) at 200 degree celsius.