Characterisation of ZnO thin films produced by filtered cathodic vacuum arc technique

ZnO thin films were deposited on (100)Si substrates using filtered cathodic vacuum arc (FCVA) technique at various temperature (room temperature to 420 degree) and with different nitrogen to oxygen flow rate ratios (01. to 0.5) at 200 degree celsius.

Saved in:

Bibliographic Details
Main Author:	Tse, Kit Yan.
Other Authors:	Hng, Huey Hoon
Format:	Theses and Dissertations
Language:	English
Published:	2008
Subjects:	DRNTU::Engineering::Materials::Photonics and optoelectronics materials
Online Access:	http://hdl.handle.net/10356/5124
Tags:	Add Tag No Tags, Be the first to tag this record!
Institution:	Nanyang Technological University
Language:	English

id	sg-ntu-dr.10356-5124
record_format	dspace
spelling	sg-ntu-dr.10356-51242023-03-04T16:30:50Z Characterisation of ZnO thin films produced by filtered cathodic vacuum arc technique Tse, Kit Yan. Hng, Huey Hoon School of Materials Science & Engineering DRNTU::Engineering::Materials::Photonics and optoelectronics materials ZnO thin films were deposited on (100)Si substrates using filtered cathodic vacuum arc (FCVA) technique at various temperature (room temperature to 420 degree) and with different nitrogen to oxygen flow rate ratios (01. to 0.5) at 200 degree celsius. Master of Engineering (MSE) 2008-09-17T10:20:37Z 2008-09-17T10:20:37Z 2004 2004 Thesis http://hdl.handle.net/10356/5124 en Nanyang Technological University 112 p. application/pdf
institution	Nanyang Technological University
building	NTU Library
continent	Asia
country	Singapore Singapore
content_provider	NTU Library
collection	DR-NTU
language	English
topic	DRNTU::Engineering::Materials::Photonics and optoelectronics materials
spellingShingle	DRNTU::Engineering::Materials::Photonics and optoelectronics materials Tse, Kit Yan. Characterisation of ZnO thin films produced by filtered cathodic vacuum arc technique
description	ZnO thin films were deposited on (100)Si substrates using filtered cathodic vacuum arc (FCVA) technique at various temperature (room temperature to 420 degree) and with different nitrogen to oxygen flow rate ratios (01. to 0.5) at 200 degree celsius.
author2	Hng, Huey Hoon
author_facet	Hng, Huey Hoon Tse, Kit Yan.
format	Theses and Dissertations
author	Tse, Kit Yan.
author_sort	Tse, Kit Yan.
title	Characterisation of ZnO thin films produced by filtered cathodic vacuum arc technique
title_short	Characterisation of ZnO thin films produced by filtered cathodic vacuum arc technique
title_full	Characterisation of ZnO thin films produced by filtered cathodic vacuum arc technique
title_fullStr	Characterisation of ZnO thin films produced by filtered cathodic vacuum arc technique
title_full_unstemmed	Characterisation of ZnO thin films produced by filtered cathodic vacuum arc technique
title_sort	characterisation of zno thin films produced by filtered cathodic vacuum arc technique
publishDate	2008
url	http://hdl.handle.net/10356/5124
_version_	1759853124275666944

Characterisation of ZnO thin films produced by filtered cathodic vacuum arc technique

Similar Items