Characterization of semiconductor heterostructures

• Main Author: Wong, Qihao.
• Other Authors: Yoon Soon Fatt
• Format: Final Year Project
• Language: English
• Published: 2012
• Subjects: DRNTU::Engineering::Electrical and electronic engineering::Semiconductors
• Online Access: http://hdl.handle.net/10356/49550
• Institution: Nanyang Technological University

Strain accelerated HF etching is a process which allows for the separation of an intermediate layer in an aqueous acidic solution. The key idea behind this etching method is to induce tensile strain on the material which will subsequently improve the rate of etching. The initial stage of this projec...