Characterization of semiconductor heterostructures

• المؤلف الرئيسي: Wong, Qihao.
• مؤلفون آخرون: Yoon Soon Fatt
• التنسيق: Final Year Project
• اللغة: English
• منشور في: 2012
• الموضوعات: DRNTU::Engineering::Electrical and electronic engineering::Semiconductors
• الوصول للمادة أونلاين: http://hdl.handle.net/10356/49550

Strain accelerated HF etching is a process which allows for the separation of an intermediate layer in an aqueous acidic solution. The key idea behind this etching method is to induce tensile strain on the material which will subsequently improve the rate of etching. The initial stage of this projec...