Characterisation and applications of chemically amplified photoresists for DUV microlithography

This project aims to elucidate factors contributing to the pattern roughness for sub-180nm gate patterning from the aspects of material properties, nature of the aerial image quality and processing histories.

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Bibliographic Details
Main Author:	Koh, Hui Peng.
Other Authors:	Hu, Xiao
Format:	Theses and Dissertations
Language:	English
Published:	2008
Subjects:	DRNTU::Engineering::Materials::Microelectronics and semiconductor materials::Nanoelectronics and interconnects
Online Access:	http://hdl.handle.net/10356/5066
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Institution:	Nanyang Technological University
Language:	English

id	sg-ntu-dr.10356-5066
record_format	dspace
spelling	sg-ntu-dr.10356-50662023-03-04T16:33:15Z Characterisation and applications of chemically amplified photoresists for DUV microlithography Koh, Hui Peng. Hu, Xiao School of Materials Science & Engineering DRNTU::Engineering::Materials::Microelectronics and semiconductor materials::Nanoelectronics and interconnects This project aims to elucidate factors contributing to the pattern roughness for sub-180nm gate patterning from the aspects of material properties, nature of the aerial image quality and processing histories. Master of Engineering (MSE) 2008-09-17T10:19:02Z 2008-09-17T10:19:02Z 2001 2001 Thesis http://hdl.handle.net/10356/5066 en Nanyang Technological University 153 p. application/pdf
institution	Nanyang Technological University
building	NTU Library
continent	Asia
country	Singapore Singapore
content_provider	NTU Library
collection	DR-NTU
language	English
topic	DRNTU::Engineering::Materials::Microelectronics and semiconductor materials::Nanoelectronics and interconnects
spellingShingle	DRNTU::Engineering::Materials::Microelectronics and semiconductor materials::Nanoelectronics and interconnects Koh, Hui Peng. Characterisation and applications of chemically amplified photoresists for DUV microlithography
description	This project aims to elucidate factors contributing to the pattern roughness for sub-180nm gate patterning from the aspects of material properties, nature of the aerial image quality and processing histories.
author2	Hu, Xiao
author_facet	Hu, Xiao Koh, Hui Peng.
format	Theses and Dissertations
author	Koh, Hui Peng.
author_sort	Koh, Hui Peng.
title	Characterisation and applications of chemically amplified photoresists for DUV microlithography
title_short	Characterisation and applications of chemically amplified photoresists for DUV microlithography
title_full	Characterisation and applications of chemically amplified photoresists for DUV microlithography
title_fullStr	Characterisation and applications of chemically amplified photoresists for DUV microlithography
title_full_unstemmed	Characterisation and applications of chemically amplified photoresists for DUV microlithography
title_sort	characterisation and applications of chemically amplified photoresists for duv microlithography
publishDate	2008
url	http://hdl.handle.net/10356/5066
_version_	1759854013090627584

Characterisation and applications of chemically amplified photoresists for DUV microlithography

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