Characterisation and applications of chemically amplified photoresists for DUV microlithography
This project aims to elucidate factors contributing to the pattern roughness for sub-180nm gate patterning from the aspects of material properties, nature of the aerial image quality and processing histories.
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| Format: | Theses and Dissertations |
| Language: | English |
| Published: |
2008
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| Online Access: | http://hdl.handle.net/10356/5066 |
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| Institution: | Nanyang Technological University |
| Language: | English |