Characterisation and applications of chemically amplified photoresists for DUV microlithography

• Main Author: Koh, Hui Peng.
• Other Authors: Hu, Xiao
• Format: Theses and Dissertations
• Language: English
• Published: 2008
• Subjects: DRNTU::Engineering::Materials::Microelectronics and semiconductor materials::Nanoelectronics and interconnects
• Online Access: http://hdl.handle.net/10356/5066
• Institution: Nanyang Technological University

This project aims to elucidate factors contributing to the pattern roughness for sub-180nm gate patterning from the aspects of material properties, nature of the aerial image quality and processing histories.