Defects of thin films on silicon wafer

Defects of thin films on silicon wafer

Borophosphosilicate glass (BPSG) is a popular dielectric thin film used in the fabrication of semiconductor devices. However, the addition of dopants like boron and phosphorus creates some defects on these thin films and that reduces the reliability of IC devices. In this work, a systematic investig...

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Bibliographic Details
Main Author: Tang, Shiau Khee.
Other Authors: Mridha, Shahjahan
Format: Theses and Dissertations
Published: 2008
Subjects:
DRNTU::Engineering::Materials::Microelectronics and semiconductor materials::Thin films
Online Access:http://hdl.handle.net/10356/5111
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Institution: Nanyang Technological University
Description
Summary:Borophosphosilicate glass (BPSG) is a popular dielectric thin film used in the fabrication of semiconductor devices. However, the addition of dopants like boron and phosphorus creates some defects on these thin films and that reduces the reliability of IC devices. In this work, a systematic investigation was carried out to characterize the defect in BPSG films.

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