Optimisation of stamp compliance for nanoimprint lithography : an experimental and simulation investigation of deformation of Polydimethylsiloxane (PDMS) and Ultraviolet Curable Polyuerthane Acrylate (UV-PUA)
Nanoimprint lithography is a method of fabricating nanometer scale patterns. These nanometer scale patterns are fabricated through replication of negative patterned imprint mold. In this Final Year Project, low mo...
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| Format: | Final Year Project |
| Language: | English |
| Published: |
2013
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| Subjects: | |
| Online Access: | http://hdl.handle.net/10356/53255 |
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| Institution: | Nanyang Technological University |
| Language: | English |
| Summary: | Nanoimprint
lithography
is
a
method
of
fabricating
nanometer
scale
patterns.
These
nanometer
scale
patterns
are
fabricated
through
replication
of
negative
patterned
imprint
mold.
In
this
Final
Year
Project,
low
modulus
mold
is
the
main
focus
for
exploring
a
new
possibility
of
imprinting
on
uneven
surfaces.
Although
low
modulus
mold
could
improve
conformability
between
mold
and
uneven
surface,
deformation
of
the
mold
might
pose
a
problem
due
to
the
low
moduli
of
the
mold
material
used.
The
objective
of
this
Final
Year
Project
is
to
then
formulate
a
simulation
process
using
Ansys
Workbench.
This
simulation
is
used
to
predict
the
deformation
of
the
mold
layer
for
nano-‐imprint
processes
under
variable
conditions
such
as:
1) Different
loading
pressure
2) Different
modulus
of
material
3) Different
aspect
ratio
of
structure
4) Bulging
behavior
with
different
materials
For
simulation
to
be
accurate,
mechanical
properties
of
the
materials
are
obtained
by
doing
tensile
tests
on
five
dog-‐bone
samples
of
each
material
to
acquire
the
engineering
stress–strain
curve.
The
true
stress–strain
curve
is
also
tabulated
by
finding
the
Poisson’s
ratio
of
each
material
and
converting
the
engineering
stress–strain
curve
to
take
into
account
for
the
reduction
of
cross-‐sectional
area
during
stretching.
After
analyzing
the
imprinting
process
in
detail,
proper
assumptions
and
boundary
conditions
are
placed
in
the
model
to
attain
the
best
possible
result
in
the
shortest
amount
of
time.
Finally,
analysis
is
done
on
the
results
of
the
simulation
and
conclusions
are
drawn
and
summarised
under
conclusion
section. |
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