Optimisation of stamp compliance for nanoimprint lithography : an experimental and simulation investigation of deformation of Polydimethylsiloxane (PDMS) and Ultraviolet Curable Polyuerthane Acrylate (UV-PUA)

• Main Author: Ong, Zongjue
• Other Authors: Hayden Kingsley Taylor
• Format: Final Year Project
• Language: English
• Published: 2013
• Subjects: DRNTU::Engineering
• Online Access: http://hdl.handle.net/10356/53255
• Institution: Nanyang Technological University

Nanoimprint lithography is a method of fabricating nanometer scale patterns. These nanometer scale patterns are fabricated through replication of negative patterned imprint mold. In this Final Year Project, low mo...