Optimisation of stamp compliance for nanoimprint lithography : an experimental and simulation investigation of deformation of Polydimethylsiloxane (PDMS) and Ultraviolet Curable Polyuerthane Acrylate (UV-PUA)
Nanoimprint lithography is a method of fabricating nanometer scale patterns. These nanometer scale patterns are fabricated through replication of negative patterned imprint mold. In this Final Year Project, low mo...
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sg-ntu-dr.10356-532552023-03-04T18:32:45Z Optimisation of stamp compliance for nanoimprint lithography : an experimental and simulation investigation of deformation of Polydimethylsiloxane (PDMS) and Ultraviolet Curable Polyuerthane Acrylate (UV-PUA) Ong, Zongjue Hayden Kingsley Taylor School of Mechanical and Aerospace Engineering A*STAR Institute of Materials Research and Engineering Tan Wui Siew DRNTU::Engineering Nanoimprint lithography is a method of fabricating nanometer scale patterns. These nanometer scale patterns are fabricated through replication of negative patterned imprint mold. In this Final Year Project, low modulus mold is the main focus for exploring a new possibility of imprinting on uneven surfaces. Although low modulus mold could improve conformability between mold and uneven surface, deformation of the mold might pose a problem due to the low moduli of the mold material used. The objective of this Final Year Project is to then formulate a simulation process using Ansys Workbench. This simulation is used to predict the deformation of the mold layer for nano-‐imprint processes under variable conditions such as: 1) Different loading pressure 2) Different modulus of material 3) Different aspect ratio of structure 4) Bulging behavior with different materials For simulation to be accurate, mechanical properties of the materials are obtained by doing tensile tests on five dog-‐bone samples of each material to acquire the engineering stress–strain curve. The true stress–strain curve is also tabulated by finding the Poisson’s ratio of each material and converting the engineering stress–strain curve to take into account for the reduction of cross-‐sectional area during stretching. After analyzing the imprinting process in detail, proper assumptions and boundary conditions are placed in the model to attain the best possible result in the shortest amount of time. Finally, analysis is done on the results of the simulation and conclusions are drawn and summarised under conclusion section. Bachelor of Engineering (Mechanical Engineering) 2013-05-31T02:40:24Z 2013-05-31T02:40:24Z 2013 2013 Final Year Project (FYP) http://hdl.handle.net/10356/53255 en Nanyang Technological University 66 p. application/pdf |
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| topic |
DRNTU::Engineering |
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DRNTU::Engineering Ong, Zongjue Optimisation of stamp compliance for nanoimprint lithography : an experimental and simulation investigation of deformation of Polydimethylsiloxane (PDMS) and Ultraviolet Curable Polyuerthane Acrylate (UV-PUA) |
| description |
Nanoimprint
lithography
is
a
method
of
fabricating
nanometer
scale
patterns.
These
nanometer
scale
patterns
are
fabricated
through
replication
of
negative
patterned
imprint
mold.
In
this
Final
Year
Project,
low
modulus
mold
is
the
main
focus
for
exploring
a
new
possibility
of
imprinting
on
uneven
surfaces.
Although
low
modulus
mold
could
improve
conformability
between
mold
and
uneven
surface,
deformation
of
the
mold
might
pose
a
problem
due
to
the
low
moduli
of
the
mold
material
used.
The
objective
of
this
Final
Year
Project
is
to
then
formulate
a
simulation
process
using
Ansys
Workbench.
This
simulation
is
used
to
predict
the
deformation
of
the
mold
layer
for
nano-‐imprint
processes
under
variable
conditions
such
as:
1) Different
loading
pressure
2) Different
modulus
of
material
3) Different
aspect
ratio
of
structure
4) Bulging
behavior
with
different
materials
For
simulation
to
be
accurate,
mechanical
properties
of
the
materials
are
obtained
by
doing
tensile
tests
on
five
dog-‐bone
samples
of
each
material
to
acquire
the
engineering
stress–strain
curve.
The
true
stress–strain
curve
is
also
tabulated
by
finding
the
Poisson’s
ratio
of
each
material
and
converting
the
engineering
stress–strain
curve
to
take
into
account
for
the
reduction
of
cross-‐sectional
area
during
stretching.
After
analyzing
the
imprinting
process
in
detail,
proper
assumptions
and
boundary
conditions
are
placed
in
the
model
to
attain
the
best
possible
result
in
the
shortest
amount
of
time.
Finally,
analysis
is
done
on
the
results
of
the
simulation
and
conclusions
are
drawn
and
summarised
under
conclusion
section. |
| author2 |
Hayden Kingsley Taylor |
| author_facet |
Hayden Kingsley Taylor Ong, Zongjue |
| format |
Final Year Project |
| author |
Ong, Zongjue |
| author_sort |
Ong, Zongjue |
| title |
Optimisation of stamp compliance for nanoimprint lithography : an experimental and simulation investigation of deformation of Polydimethylsiloxane (PDMS) and Ultraviolet Curable Polyuerthane Acrylate (UV-PUA) |
| title_short |
Optimisation of stamp compliance for nanoimprint lithography : an experimental and simulation investigation of deformation of Polydimethylsiloxane (PDMS) and Ultraviolet Curable Polyuerthane Acrylate (UV-PUA) |
| title_full |
Optimisation of stamp compliance for nanoimprint lithography : an experimental and simulation investigation of deformation of Polydimethylsiloxane (PDMS) and Ultraviolet Curable Polyuerthane Acrylate (UV-PUA) |
| title_fullStr |
Optimisation of stamp compliance for nanoimprint lithography : an experimental and simulation investigation of deformation of Polydimethylsiloxane (PDMS) and Ultraviolet Curable Polyuerthane Acrylate (UV-PUA) |
| title_full_unstemmed |
Optimisation of stamp compliance for nanoimprint lithography : an experimental and simulation investigation of deformation of Polydimethylsiloxane (PDMS) and Ultraviolet Curable Polyuerthane Acrylate (UV-PUA) |
| title_sort |
optimisation of stamp compliance for nanoimprint lithography : an experimental and simulation investigation of deformation of polydimethylsiloxane (pdms) and ultraviolet curable polyuerthane acrylate (uv-pua) |
| publishDate |
2013 |
| url |
http://hdl.handle.net/10356/53255 |
| _version_ |
1759857633452359680 |