Selective emitters prepared by high density plasma immersion ion implantation (HD-PIII) in silicon wafer based solar cell

• 主要作者: Seow, Leslie Kai Tong.
• 其他作者: Sun Changqing
• 格式: Final Year Project
• 語言: English
• 出版: 2013
• 主題: DRNTU::Engineering::Electrical and electronic engineering::Microelectronics
• 在線閱讀: http://hdl.handle.net/10356/53370

Plasma Ion Immersion Implantation is a rapidly developing modification technique used for doping the near-surface regions of materials by implanting energetic ions from plasma, which will surround the sample in the vacuum chamber. This technique is widely known for its accuracy for dopant concentrat...