Studies of wafer level electromigration test for ULSI
Microelectronic test structures are used for wide variety of tasks which include equipment characterizations, reliability evaluations, defect monitoring, transistor parameter extraction and process verification and development. Similarly, test structures are used in electromigration evaluation. In t...
Saved in:
主要作者: | |
---|---|
其他作者: | |
格式: | Theses and Dissertations |
出版: |
2008
|
主題: | |
在線閱讀: | http://hdl.handle.net/10356/3299 |
標簽: |
添加標簽
沒有標簽, 成為第一個標記此記錄!
|
機構: | Nanyang Technological University |