Defect pattern detection using a new rule-based approach

Automated inspection of semiconductor defect data has become increasingly important over the past several years as a means of quickly understanding and controlling contamination sources and process faults, which impact product yield. To address the issue of too much data and too little time, automat...

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Bibliographic Details
Main Author: Shankar, N. G
Other Authors: Zhong Zhaowei
Format: Theses and Dissertations
Published: 2008
Subjects:
Online Access:https://hdl.handle.net/10356/6209
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Institution: Nanyang Technological University

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