Rapid thermal processing of GAN-based and ALGAINP-based semiconductors for semiconductor laser applications

This project aimed (1) to establish the relationship between the processing parameters involved in rapid thermal annealing (RTA) and anodic oxide induced intermixing (AOII) and material properties of semiconductor epitaxial layers, and (2) to establish the relationship between the processing paramet...

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Main Authors: Yuan, Shu, Hing, Peter, Ooi, B. S., Zhang, Dao Hua, Chua, Soon Jun
Other Authors: School of Materials Science & Engineering
Format: Research Report
Published: 2008
Subjects:
Online Access:http://hdl.handle.net/10356/6777
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Institution: Nanyang Technological University
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spelling sg-ntu-dr.10356-67772023-07-08T06:39:49Z Rapid thermal processing of GAN-based and ALGAINP-based semiconductors for semiconductor laser applications Yuan, Shu Hing, Peter Ooi, B. S. Zhang, Dao Hua Chua, Soon Jun School of Materials Science & Engineering DRNTU::Engineering::Materials::Microelectronics and semiconductor materials::Thin films This project aimed (1) to establish the relationship between the processing parameters involved in rapid thermal annealing (RTA) and anodic oxide induced intermixing (AOII) and material properties of semiconductor epitaxial layers, and (2) to establish the relationship between the processing parameters involved in RTA and AOII and device performance of LEDs and laser diodes. RG 5/99 2008-09-17T14:24:42Z 2008-09-17T14:24:42Z 2003 2003 Research Report http://hdl.handle.net/10356/6777 Nanyang Technological University 215 p. application/pdf
institution Nanyang Technological University
building NTU Library
continent Asia
country Singapore
Singapore
content_provider NTU Library
collection DR-NTU
topic DRNTU::Engineering::Materials::Microelectronics and semiconductor materials::Thin films
spellingShingle DRNTU::Engineering::Materials::Microelectronics and semiconductor materials::Thin films
Yuan, Shu
Hing, Peter
Ooi, B. S.
Zhang, Dao Hua
Chua, Soon Jun
Rapid thermal processing of GAN-based and ALGAINP-based semiconductors for semiconductor laser applications
description This project aimed (1) to establish the relationship between the processing parameters involved in rapid thermal annealing (RTA) and anodic oxide induced intermixing (AOII) and material properties of semiconductor epitaxial layers, and (2) to establish the relationship between the processing parameters involved in RTA and AOII and device performance of LEDs and laser diodes.
author2 School of Materials Science & Engineering
author_facet School of Materials Science & Engineering
Yuan, Shu
Hing, Peter
Ooi, B. S.
Zhang, Dao Hua
Chua, Soon Jun
format Research Report
author Yuan, Shu
Hing, Peter
Ooi, B. S.
Zhang, Dao Hua
Chua, Soon Jun
author_sort Yuan, Shu
title Rapid thermal processing of GAN-based and ALGAINP-based semiconductors for semiconductor laser applications
title_short Rapid thermal processing of GAN-based and ALGAINP-based semiconductors for semiconductor laser applications
title_full Rapid thermal processing of GAN-based and ALGAINP-based semiconductors for semiconductor laser applications
title_fullStr Rapid thermal processing of GAN-based and ALGAINP-based semiconductors for semiconductor laser applications
title_full_unstemmed Rapid thermal processing of GAN-based and ALGAINP-based semiconductors for semiconductor laser applications
title_sort rapid thermal processing of gan-based and algainp-based semiconductors for semiconductor laser applications
publishDate 2008
url http://hdl.handle.net/10356/6777
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