Halftoning band gap of InAs/InP quantum dots using inductively coupled argon plasma-enhanced intermixing

Inductively coupled argon plasma-enhanced intermixing of InAs/InP quantum dots grown on InP substrate is investigated. Intermixing is promoted by the near-surface defects generated by plasma exposure in annealing at a temperature of 600  degrees celcius for 30 s. The annealing results in a maximum d...

Full description

Saved in:
Bibliographic Details
Main Authors: Xu, C. D., Mei, Ting, Nie, Dong, Dong, Jian Rong
Other Authors: School of Electrical and Electronic Engineering
Format: Article
Language:English
Published: 2010
Subjects:
Online Access:https://hdl.handle.net/10356/92080
http://hdl.handle.net/10220/6409
Tags: Add Tag
No Tags, Be the first to tag this record!
Institution: Nanyang Technological University
Language: English
Be the first to leave a comment!
You must be logged in first