Halftoning band gap of InAs/InP quantum dots using inductively coupled argon plasma-enhanced intermixing

• Main Authors: Xu, C. D., Mei, Ting, Nie, Dong, Dong, Jian Rong
• 其他作者: School of Electrical and Electronic Engineering
• 格式: Article
• 語言: English
• 出版: 2010
• 主題: DRNTU::Engineering::Electrical and electronic engineering::Electronic apparatus and materials
• 在線閱讀: https://hdl.handle.net/10356/92080; http://hdl.handle.net/10220/6409

Inductively coupled argon plasma-enhanced intermixing of InAs/InP quantum dots grown on InP substrate is investigated. Intermixing is promoted by the near-surface defects generated by plasma exposure in annealing at a temperature of 600 degrees celcius for 30 s. The annealing results in a maximum d...