Halftoning band gap of InAs/InP quantum dots using inductively coupled argon plasma-enhanced intermixing
Inductively coupled argon plasma-enhanced intermixing of InAs/InP quantum dots grown on InP substrate is investigated. Intermixing is promoted by the near-surface defects generated by plasma exposure in annealing at a temperature of 600 degrees celcius for 30 s. The annealing results in a maximum d...
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Main Authors: | , , , |
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Other Authors: | |
Format: | Article |
Language: | English |
Published: |
2010
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Subjects: | |
Online Access: | https://hdl.handle.net/10356/92080 http://hdl.handle.net/10220/6409 |
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Institution: | Nanyang Technological University |
Language: | English |
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