Formation and characterization of magnetron sputtered Ta–Si–N–O thin films

• المؤلفون الرئيسيون: Xu, S., Chen, Z., Yan, H., Li, L., Ho, F. Y., Liang, M. H., Pan, J. S.
• مؤلفون آخرون: School of Materials Science & Engineering
• التنسيق: مقال
• اللغة: English
• منشور في: 2012
• الموضوعات: DRNTU::Engineering::Materials::Microelectronics and semiconductor materials::Thin films
• الوصول للمادة أونلاين: https://hdl.handle.net/10356/94102; http://hdl.handle.net/10220/8204

Tantalum silicon nitride films have good potential to be used as hard coatings and diffusion barriers. In this work, films with different composition were deposited using a magnetron sputter under varying nitrogen flow rates. The composition, microstructure, thermal stability and electrical resis...