Nickel silicide formation using multiple-pulsed laser annealing

The effect of multiple-pulsed laser irradiation on Ni silicide formation in Ni(Ti) /Si system was studied. A layered structure consisting of both crystalline NiSi2 and Ni-rich Ni–Si amorphous phases with a protective TiOx overlayer was formed after five-pulsed laser annealing at 0.4 J...

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Main Authors: Setiawan, Y., Chow, F. L., Lee, Pooi See, Pey, Kin Leong, Wang, X. C., Lim, G. C.
其他作者: School of Materials Science & Engineering
格式: Article
語言:English
出版: 2012
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在線閱讀:https://hdl.handle.net/10356/94999
http://hdl.handle.net/10220/8009
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