Nickel silicide formation using multiple-pulsed laser annealing

The effect of multiple-pulsed laser irradiation on Ni silicide formation in Ni(Ti) /Si system was studied. A layered structure consisting of both crystalline NiSi2 and Ni-rich Ni–Si amorphous phases with a protective TiOx overlayer was formed after five-pulsed laser annealing at 0.4 J...

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Main Authors: Setiawan, Y., Chow, F. L., Lee, Pooi See, Pey, Kin Leong, Wang, X. C., Lim, G. C.
Other Authors: School of Materials Science & Engineering
Format: Article
Language:English
Published: 2012
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Online Access:https://hdl.handle.net/10356/94999
http://hdl.handle.net/10220/8009
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Institution: Nanyang Technological University
Language: English
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spelling sg-ntu-dr.10356-949992023-07-14T15:46:33Z Nickel silicide formation using multiple-pulsed laser annealing Setiawan, Y. Chow, F. L. Lee, Pooi See Pey, Kin Leong Wang, X. C. Lim, G. C. School of Materials Science & Engineering DRNTU::Engineering::Materials The effect of multiple-pulsed laser irradiation on Ni silicide formation in Ni(Ti) /Si system was studied. A layered structure consisting of both crystalline NiSi2 and Ni-rich Ni–Si amorphous phases with a protective TiOx overlayer was formed after five-pulsed laser annealing at 0.4 J cm−2. Different solidification velocities caused by a variation in the atomic concentration across the melt have led to the formation of this layered structure. On the other hand, by increasing the number of laser pulses, a continuous layer of polycrystalline NiSi was obtained after a 20-pulsed laser annealing at 0.3 J cm−2 laser fluence. Its formation is attributed to a better elemental mixing which occurred during subsequent pulses. Enhancement of surface absorption and remelting of the phases formed is proposed as the mechanism governing the continuous NiSi layer formation. Published version 2012-05-16T06:07:04Z 2019-12-06T19:06:11Z 2012-05-16T06:07:04Z 2019-12-06T19:06:11Z 2007 2007 Journal Article Setiawan, Y., Lee, P. S., Pey, K. L., Wang, X. C., Lim, G. C., & Chow, F. L. (2007). Nickel silicide formation using multiple-pulsed laser annealing. Journal of Applied Physics, 101(3). https://hdl.handle.net/10356/94999 http://hdl.handle.net/10220/8009 10.1063/1.2433707 en Journal of applied physics © 2007 American Institute of Physics. This paper was published in Journal of Applied Physics and is made available as an electronic reprint (preprint) with permission of American Institute of Physics. The paper can be found at the following official URL: http://dx.doi.org/10.1063/1.2433707. One print or electronic copy may be made for personal use only. Systematic or multiple reproduction, distribution to multiple locations via electronic or other means, duplication of any material in this paper for a fee or for commercial purposes, or modification of the content of the paper is prohibited and is subject to penalties under law. 5 p. application/pdf
institution Nanyang Technological University
building NTU Library
continent Asia
country Singapore
Singapore
content_provider NTU Library
collection DR-NTU
language English
topic DRNTU::Engineering::Materials
spellingShingle DRNTU::Engineering::Materials
Setiawan, Y.
Chow, F. L.
Lee, Pooi See
Pey, Kin Leong
Wang, X. C.
Lim, G. C.
Nickel silicide formation using multiple-pulsed laser annealing
description The effect of multiple-pulsed laser irradiation on Ni silicide formation in Ni(Ti) /Si system was studied. A layered structure consisting of both crystalline NiSi2 and Ni-rich Ni–Si amorphous phases with a protective TiOx overlayer was formed after five-pulsed laser annealing at 0.4 J cm−2. Different solidification velocities caused by a variation in the atomic concentration across the melt have led to the formation of this layered structure. On the other hand, by increasing the number of laser pulses, a continuous layer of polycrystalline NiSi was obtained after a 20-pulsed laser annealing at 0.3 J cm−2 laser fluence. Its formation is attributed to a better elemental mixing which occurred during subsequent pulses. Enhancement of surface absorption and remelting of the phases formed is proposed as the mechanism governing the continuous NiSi layer formation.
author2 School of Materials Science & Engineering
author_facet School of Materials Science & Engineering
Setiawan, Y.
Chow, F. L.
Lee, Pooi See
Pey, Kin Leong
Wang, X. C.
Lim, G. C.
format Article
author Setiawan, Y.
Chow, F. L.
Lee, Pooi See
Pey, Kin Leong
Wang, X. C.
Lim, G. C.
author_sort Setiawan, Y.
title Nickel silicide formation using multiple-pulsed laser annealing
title_short Nickel silicide formation using multiple-pulsed laser annealing
title_full Nickel silicide formation using multiple-pulsed laser annealing
title_fullStr Nickel silicide formation using multiple-pulsed laser annealing
title_full_unstemmed Nickel silicide formation using multiple-pulsed laser annealing
title_sort nickel silicide formation using multiple-pulsed laser annealing
publishDate 2012
url https://hdl.handle.net/10356/94999
http://hdl.handle.net/10220/8009
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